Great substrates and high-quality materials are key ingredients for making state-of-the-art devices. This award aims to showcase breakthroughs in this field, such as increases in the size or crystal quality of substrates, the unveiling of new materials, and the introduction of precursors with greater levels of purity.
Cold Split Technology
MOCVD Capability for 10kV+ β-Ga2O3 Films
GaN-on-Silicon Epiwafer Technology Without Carbon Doping
Measurements of substrates, epiwafers and devices are essential to manufacturing. This is needed to unveil problems with processes, ensure high yields and enable the delivery of products complying with specifications. This award will be contested by companies that offer specialist measurement services; and manufacturers of metrology equipment that either offer a new insight into materials, or set a new benchmark for the time taken for material characterisation.
The XRTmicron System